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A Study on the Origins of Cultural Films in Korea: A Focus on Films by the Japanese Government-General of Korea

Ryeosil Kim

International Journal of Korean History. 2014;19(2):1-34. Published online 2014 August 31 DOI: https://doi.org/10.22372/ijkh.2014.19.2.1

A Study on the Origins of Cultural Films in Korea: A Focus on Films by the Japanese Government-General of Korea

Ryeosil Kim

International Journal of Korean History. 2014;19(2):1-34

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Sputtered CdTe thin film solar cells with Cu2Te/Au back contact

Yongseob Park, Suho Lee, Junsin Yi, Byung-Duck Choi, Doyoung Kim, Jaehyeong Lee

Thin Solid Films. 2013;546:337-341

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Angular dependence of SiO2 etching in plasmas containing heptafluoropropyl methyl ether

Jun-Hyun Kim, Jin-Su Park, Chang-Koo Kim

Thin Solid Films. 2019;669:262-268

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Broadband enhancement of optical absorption in a silicon nanowire flexible thin film

Jin-Young Jung, Keya Zhou, Jung-Ho Lee

Thin Solid Films. 2014;570:75-80

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Investigation of boron-doped hydrogenated silicon films as a thermo-sensing layer for uncooled microbolometer

Choonghoon Shin, Duy Phong Pham, Jinjoo Park, Youn-Jung Lee, Sangho Kim, Junsin Yi

Thin Solid Films. 2019;690:137515

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Electroforming-less and multi-level resistive switching characteristics in tungsten oxide thin film

Seunghyup Lee, Ki Hoon Yun, Doeun Kim

Thin Solid Films. 2019;674:91-96

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Optimal synthesis of antimony-doped cuprous oxides for photoelectrochemical applications

Young Dae Yun, Seung Ki Baek, Joo Sung Kim, Young Been Kim, Sung Hyeon Jung, Yunseok Kim, Hyung Koun Cho

Thin Solid Films. 2019;671:120-126

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Electromagnetic interference shielding characteristics and shielding effectiveness of polyaniline-coated films

B.R. Kim, H.K. Lee, S.H. Park, H.K. Kim

Thin Solid Films. 2011;519(11):3492-3496

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Crystallinity, etchability, electrical and mechanical properties of Ga doped amorphous indium tin oxide thin films deposited by direct current magnetron sputtering

Hyun-Jun Lee, Pung-Keun Song

Thin Solid Films. 2014;559:53-57

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Oxidation of nano-multilayered CrN/AlMgSiN thin films between 600 and 900°C in air

Dong Bok Lee, Sun Kyu Kim

Thin Solid Films. 2013;531:306-311

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